WO2008099702A1 - エレクトロウェッティングデバイス及びその製造方法 - Google Patents

エレクトロウェッティングデバイス及びその製造方法 Download PDF

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Publication number
WO2008099702A1
WO2008099702A1 PCT/JP2008/051774 JP2008051774W WO2008099702A1 WO 2008099702 A1 WO2008099702 A1 WO 2008099702A1 JP 2008051774 W JP2008051774 W JP 2008051774W WO 2008099702 A1 WO2008099702 A1 WO 2008099702A1
Authority
WO
WIPO (PCT)
Prior art keywords
insulating
insulating film
electrowetting device
liquid
film
Prior art date
Application number
PCT/JP2008/051774
Other languages
English (en)
French (fr)
Inventor
Shina Kirita
Toshitaka Kawashima
Original Assignee
Sony Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corporation filed Critical Sony Corporation
Priority to US12/526,912 priority Critical patent/US8081389B2/en
Priority to EP08710753A priority patent/EP2112532A4/en
Publication of WO2008099702A1 publication Critical patent/WO2008099702A1/ja

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005—Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G02B3/14—Fluid-filled or evacuated lenses of variable focal length

Abstract

　本発明に係るエレクトロウェッティングデバイス（１０）は、高誘電率膜を用いることによる耐圧特性の劣化を防止して信頼性の高い絶縁構造を確保できるものであり、導電性の第１の液体（１１）と、絶縁性の第２の液体（１２）と、上記第１，第２の液体を収容する液室（１８）を形成する透明基板（１４）及び蓋体（１５）と、透明基板（１４）の液室（１８）側の表面に形成された電極層（１６）と、この電極層の表面に形成された絶縁層（１７）とを備え、この絶縁層（１７）は、絶縁性無機結晶材料からなる第１の絶縁膜（１７ａ）と、絶縁性無機非晶質材料からなる第２の絶縁膜（１７ｂ）の積層構造とすることで、第１の絶縁膜（１７ａ）の表面凹凸を第２の絶縁膜（１７ｂ）で緩和し、低電圧駆動が可能であり、耐圧強度に優れた信頼性の高い絶縁層を得ることができる。
PCT/JP2008/051774 2007-02-13 2008-02-04 エレクトロウェッティングデバイス及びその製造方法 WO2008099702A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/526,912 US8081389B2 (en) 2007-02-13 2008-02-04 Electro-wetting device and a method of manufacturing the same
EP08710753A EP2112532A4 (en) 2007-02-13 2008-02-04 ELECTROBONDING DEVICE AND MANUFACTURING METHOD THEREFOR

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-031442 2007-02-13
JP2007031442A JP2008197296A (ja) 2007-02-13 2007-02-13 エレクトロウェッティングデバイス及びその製造方法

Publications (1)

Publication Number Publication Date
WO2008099702A1 true WO2008099702A1 (ja) 2008-08-21

Family

ID=39689946

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051774 WO2008099702A1 (ja) 2007-02-13 2008-02-04 エレクトロウェッティングデバイス及びその製造方法

Country Status (5)

Country Link
US (1) US8081389B2 (ja)
EP (1) EP2112532A4 (ja)
JP (1) JP2008197296A (ja)
CN (1) CN101606085A (ja)
WO (1) WO2008099702A1 (ja)

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CN114270241A (zh) * 2019-06-26 2022-04-01 康宁股份有限公司 电润湿光学设备及其制造方法
JP2021181932A (ja) * 2020-05-19 2021-11-25 国立研究開発法人産業技術総合研究所 放射性組成物の製造方法
CN112526655A (zh) * 2020-11-18 2021-03-19 上海酷聚科技有限公司 液体透镜、液体透镜的使用方法及其制备方法
CN113495355B (zh) * 2021-04-06 2023-01-20 哈尔滨工业大学（深圳） 基于浸润表面复合介电层的电润湿液体透镜以及制作方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11577245B2 (en) 2018-09-06 2023-02-14 Sharp Kabushiki Kaisha Electrowetting device

Also Published As

Publication number Publication date
US8081389B2 (en) 2011-12-20
EP2112532A4 (en) 2012-01-18
US20100046084A1 (en) 2010-02-25
CN101606085A (zh) 2009-12-16
JP2008197296A (ja) 2008-08-28
EP2112532A1 (en) 2009-10-28

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