WO2006024998A3 - A laser projection system - Google Patents

A laser projection system Download PDF

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Publication number
WO2006024998A3
WO2006024998A3 PCT/IB2005/052787 IB2005052787W WO2006024998A3 WO 2006024998 A3 WO2006024998 A3 WO 2006024998A3 IB 2005052787 W IB2005052787 W IB 2005052787W WO 2006024998 A3 WO2006024998 A3 WO 2006024998A3
Authority
WO
WIPO (PCT)
Prior art keywords
cell
projection system
laser projection
coherence
laser beam
Prior art date
Application number
PCT/IB2005/052787
Other languages
French (fr)
Other versions
WO2006024998A2 (en
Inventor
Renatus H M Sanders
Johannus W Weekamp
Original Assignee
Koninkl Philips Electronics Nv
Renatus H M Sanders
Johannus W Weekamp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Renatus H M Sanders, Johannus W Weekamp filed Critical Koninkl Philips Electronics Nv
Priority to DE602005005836T priority Critical patent/DE602005005836T2/en
Priority to US11/573,915 priority patent/US7775670B2/en
Priority to EP05781102A priority patent/EP1787167B1/en
Priority to JP2007529095A priority patent/JP4658127B2/en
Publication of WO2006024998A2 publication Critical patent/WO2006024998A2/en
Publication of WO2006024998A3 publication Critical patent/WO2006024998A3/en

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/74Projection arrangements for image reproduction, e.g. using eidophor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/12Fluid-filled or evacuated lenses
    • G02B3/14Fluid-filled or evacuated lenses of variable focal length
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48Laser speckle optics
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00Details of colour television systems
    • H04N9/12Picture reproducers
    • H04N9/31Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3129Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] scanning a light beam on the display screen

Abstract

The present invention relates to a laser projection system (1) having means for reducing the coherence of a generated laser beam (3) in order to reduce the occurrence of annoying speckle artefacts in images produced by the system. Coherence is reduced by letting the laser beam (3) pass through a transparent cell (6) comprising first (A) and second (B) immiscible fluids having different refractive indices. The fluids are displaced in the cell, preferably using an electrowetting technique. The cell (6) may thus be realised as an electrowetting lens, which is driven with a pseudo random driving signal.
PCT/IB2005/052787 2004-08-30 2005-08-25 A laser projection system WO2006024998A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE602005005836T DE602005005836T2 (en) 2004-08-30 2005-08-25 Laser projection system
US11/573,915 US7775670B2 (en) 2004-08-30 2005-08-25 Laser projection system
EP05781102A EP1787167B1 (en) 2004-08-30 2005-08-25 Laser projection system
JP2007529095A JP4658127B2 (en) 2004-08-30 2005-08-25 Laser projection system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04104148 2004-08-30
EP04104148.4 2004-08-30

Publications (2)

Publication Number Publication Date
WO2006024998A2 WO2006024998A2 (en) 2006-03-09
WO2006024998A3 true WO2006024998A3 (en) 2006-10-26

Family

ID=35207687

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2005/052787 WO2006024998A2 (en) 2004-08-30 2005-08-25 A laser projection system

Country Status (8)

Country Link
US (1) US7775670B2 (en)
EP (1) EP1787167B1 (en)
JP (1) JP4658127B2 (en)
KR (1) KR20070048205A (en)
CN (1) CN100483259C (en)
AT (1) ATE391309T1 (en)
DE (1) DE602005005836T2 (en)
WO (1) WO2006024998A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100007934A1 (en) * 2007-01-18 2010-01-14 Sharp Kabushiki Kaisha Optical Element and Image Display Device Using the Same
US7862183B2 (en) 2007-10-16 2011-01-04 Alcatel-Lucent Usa Inc. Speckle reduction using a tunable liquid lens
WO2010125562A1 (en) 2009-04-26 2010-11-04 X.D.M. Ltd. Laser projector with reduced speckle effect
US8130433B2 (en) 2009-04-29 2012-03-06 Corning Incorporated Spinning optics for speckle mitigation in laser projection systems
US8077367B2 (en) 2009-04-29 2011-12-13 Corning Incorporated Speckle mitigation in laser projection systems
US20120154889A1 (en) * 2009-09-16 2012-06-21 Sharp Kabushiki Kaisha Display element and electric apparatus using the same
DE102011101323A1 (en) * 2011-05-12 2012-11-15 Osram Opto Semiconductors Gmbh Optoelectronic component for use in e.g. projection application, has control device operating optical phase switch, where different optical path lengths are assigned for laser light for different modes of operation of optical phase switch
CN105093559B (en) * 2014-05-15 2017-07-28 中国科学院理化技术研究所 A kind of eliminating coherence device
DE102014118378A1 (en) * 2014-12-11 2016-06-16 Hella Kgaa Hueck & Co. Lighting device for vehicles
JP2018031990A (en) * 2016-08-26 2018-03-01 大日本印刷株式会社 Screen and display

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5272473A (en) * 1989-02-27 1993-12-21 Texas Instruments Incorporated Reduced-speckle display system
US20010007510A1 (en) * 1996-06-11 2001-07-12 Andreas Dorsel Method and apparatus for reducing the formation of spots in laser projection
US20020126981A1 (en) * 2001-02-20 2002-09-12 Eastman Kodak Company Speckle suppressed laser projection system with partial beam reflection
WO2005006720A1 (en) * 2003-07-14 2005-01-20 Koninklijke Philips Electronics N.V. Projection device

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755349B2 (en) 1987-09-17 1998-05-20 オリンパス光学工業株式会社 Illumination optical system of semiconductor exposure equipment
JPH05173094A (en) 1991-12-20 1993-07-13 Sony Corp Laser display device
US6629641B2 (en) 2000-06-07 2003-10-07 Metrologic Instruments, Inc. Method of and system for producing images of objects using planar laser illumination beams and image detection arrays
JP3986137B2 (en) 1997-09-26 2007-10-03 オリンパス株式会社 Laser illumination device and optical device using the same
FR2769375B1 (en) * 1997-10-08 2001-01-19 Univ Joseph Fourier VARIABLE FOCAL LENS
US6816302B2 (en) 1998-03-02 2004-11-09 Micronic Laser Systems Ab Pattern generator
US6069739A (en) 1998-06-30 2000-05-30 Intel Corporation Method and lens arrangement to improve imaging performance of microlithography exposure tool
JP4345127B2 (en) 1999-03-18 2009-10-14 ソニー株式会社 Lighting device and lighting method
US6839469B2 (en) 2000-01-21 2005-01-04 Lam K. Nguyen Multiparallel three dimensional optical microscopy system
JP2002267825A (en) 2001-03-09 2002-09-18 Sony Corp Diffraction type lens element and illumination device using the same
US6594090B2 (en) * 2001-08-27 2003-07-15 Eastman Kodak Company Laser projection display system
US6577429B1 (en) * 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system
JP4662713B2 (en) * 2002-02-14 2011-03-30 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Variable focus lens
JP4290095B2 (en) * 2004-08-16 2009-07-01 キヤノン株式会社 Display optical system and image display system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5272473A (en) * 1989-02-27 1993-12-21 Texas Instruments Incorporated Reduced-speckle display system
US20010007510A1 (en) * 1996-06-11 2001-07-12 Andreas Dorsel Method and apparatus for reducing the formation of spots in laser projection
US20020126981A1 (en) * 2001-02-20 2002-09-12 Eastman Kodak Company Speckle suppressed laser projection system with partial beam reflection
WO2005006720A1 (en) * 2003-07-14 2005-01-20 Koninklijke Philips Electronics N.V. Projection device

Also Published As

Publication number Publication date
DE602005005836D1 (en) 2008-05-15
JP2008511853A (en) 2008-04-17
EP1787167B1 (en) 2008-04-02
CN100483259C (en) 2009-04-29
US7775670B2 (en) 2010-08-17
JP4658127B2 (en) 2011-03-23
ATE391309T1 (en) 2008-04-15
CN101010638A (en) 2007-08-01
WO2006024998A2 (en) 2006-03-09
KR20070048205A (en) 2007-05-08
DE602005005836T2 (en) 2009-05-14
US20080278692A1 (en) 2008-11-13
EP1787167A2 (en) 2007-05-23

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