DE69535692D1 - Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken - Google Patents

Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken

Info

Publication number
DE69535692D1
DE69535692D1 DE69535692T DE69535692T DE69535692D1 DE 69535692 D1 DE69535692 D1 DE 69535692D1 DE 69535692 T DE69535692 T DE 69535692T DE 69535692 T DE69535692 T DE 69535692T DE 69535692 D1 DE69535692 D1 DE 69535692D1
Authority
DE
Germany
Prior art keywords
photomasks
automated testing
automated
testing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69535692T
Other languages
English (en)
Other versions
DE69535692T2 (de
Inventor
David Garth Emery
Zain Kahuna Saidin
Mark J Wihl
Tao-Yi Fu
Marek Zywno
Damon F Kvamme
Michael E Fein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23047672&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69535692(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of DE69535692D1 publication Critical patent/DE69535692D1/de
Application granted granted Critical
Publication of DE69535692T2 publication Critical patent/DE69535692T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
DE69535692T 1994-07-13 1995-07-11 Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken Expired - Lifetime DE69535692T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/274,310 US5563702A (en) 1991-08-22 1994-07-13 Automated photomask inspection apparatus and method
US274310 1994-07-13

Publications (2)

Publication Number Publication Date
DE69535692D1 true DE69535692D1 (de) 2008-03-06
DE69535692T2 DE69535692T2 (de) 2009-01-22

Family

ID=23047672

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69535692T Expired - Lifetime DE69535692T2 (de) 1994-07-13 1995-07-11 Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken
DE69534469T Expired - Lifetime DE69534469T2 (de) 1994-07-13 1995-07-11 Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69534469T Expired - Lifetime DE69534469T2 (de) 1994-07-13 1995-07-11 Verfahren und Vorrichtung zur automatisierten Prüfung von Photomasken

Country Status (5)

Country Link
US (2) US5563702A (de)
EP (2) EP1353165B1 (de)
JP (5) JP3020462U (de)
DE (2) DE69535692T2 (de)
WO (1) WO1996002825A1 (de)

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JPH0876359A (ja) 1996-03-22
DE69534469T2 (de) 2006-01-26
DE69534469D1 (de) 2005-10-27
EP0787289A4 (de) 1997-08-06
EP0787289B1 (de) 2005-09-21
EP0787289A1 (de) 1997-08-06
JP2003207459A (ja) 2003-07-25
JP2006085182A (ja) 2006-03-30
JP4347901B2 (ja) 2009-10-21
DE69535692T2 (de) 2009-01-22
WO1996002825A1 (en) 1996-02-01
EP1353165A2 (de) 2003-10-15
EP1353165A3 (de) 2004-01-28
US5737072A (en) 1998-04-07
JP4234705B2 (ja) 2009-03-04
EP1353165B1 (de) 2008-01-16
US5563702A (en) 1996-10-08
JP2008262230A (ja) 2008-10-30
JP3419963B2 (ja) 2003-06-23
JP3020462U (ja) 1996-01-23

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