DE602005005836D1 - Laserprojektionssystem - Google Patents

Laserprojektionssystem

Info

Publication number
DE602005005836D1
DE602005005836D1 DE602005005836T DE602005005836T DE602005005836D1 DE 602005005836 D1 DE602005005836 D1 DE 602005005836D1 DE 602005005836 T DE602005005836 T DE 602005005836T DE 602005005836 T DE602005005836 T DE 602005005836T DE 602005005836 D1 DE602005005836 D1 DE 602005005836D1
Authority
DE
Germany
Prior art keywords
cell
projection system
laser projection
coherence
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005005836T
Other languages
English (en)
Other versions
DE602005005836T2 (de
Inventor
Renatus H Sanders
Johannus W Weekamp
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of DE602005005836D1 publication Critical patent/DE602005005836D1/de
Application granted granted Critical
Publication of DE602005005836T2 publication Critical patent/DE602005005836T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/74Projection arrangements for image reproduction, e.g. using eidophor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/12Fluid-filled or evacuated lenses
    • G02B3/14Fluid-filled or evacuated lenses of variable focal length
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/004Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid
    • G02B26/005Optical devices or arrangements for the control of light using movable or deformable optical elements based on a displacement or a deformation of a fluid based on electrowetting
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/06Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the phase of light
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48Laser speckle optics
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00Details of colour television systems
    • H04N9/12Picture reproducers
    • H04N9/31Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3129Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] scanning a light beam on the display screen
DE602005005836T 2004-08-30 2005-08-25 Laserprojektionssystem Active DE602005005836T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04104148 2004-08-30
EP04104148 2004-08-30
PCT/IB2005/052787 WO2006024998A2 (en) 2004-08-30 2005-08-25 A laser projection system

Publications (2)

Publication Number Publication Date
DE602005005836D1 true DE602005005836D1 (de) 2008-05-15
DE602005005836T2 DE602005005836T2 (de) 2009-05-14

Family

ID=35207687

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005005836T Active DE602005005836T2 (de) 2004-08-30 2005-08-25 Laserprojektionssystem

Country Status (8)

Country Link
US (1) US7775670B2 (de)
EP (1) EP1787167B1 (de)
JP (1) JP4658127B2 (de)
KR (1) KR20070048205A (de)
CN (1) CN100483259C (de)
AT (1) ATE391309T1 (de)
DE (1) DE602005005836T2 (de)
WO (1) WO2006024998A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100007934A1 (en) * 2007-01-18 2010-01-14 Sharp Kabushiki Kaisha Optical Element and Image Display Device Using the Same
US7862183B2 (en) 2007-10-16 2011-01-04 Alcatel-Lucent Usa Inc. Speckle reduction using a tunable liquid lens
WO2010125562A1 (en) 2009-04-26 2010-11-04 X.D.M. Ltd. Laser projector with reduced speckle effect
US8130433B2 (en) 2009-04-29 2012-03-06 Corning Incorporated Spinning optics for speckle mitigation in laser projection systems
US8077367B2 (en) 2009-04-29 2011-12-13 Corning Incorporated Speckle mitigation in laser projection systems
US20120154889A1 (en) * 2009-09-16 2012-06-21 Sharp Kabushiki Kaisha Display element and electric apparatus using the same
DE102011101323A1 (de) * 2011-05-12 2012-11-15 Osram Opto Semiconductors Gmbh Optoelektronisches Bauteil
CN105093559B (zh) * 2014-05-15 2017-07-28 中国科学院理化技术研究所 一种消相干装置
DE102014118378A1 (de) * 2014-12-11 2016-06-16 Hella Kgaa Hueck & Co. Beleuchtungsvorrichtung für Fahrzeuge
JP2018031990A (ja) * 2016-08-26 2018-03-01 大日本印刷株式会社 スクリーンおよび表示装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2755349B2 (ja) 1987-09-17 1998-05-20 オリンパス光学工業株式会社 半導体露光装置の照明光学系
US5272473A (en) * 1989-02-27 1993-12-21 Texas Instruments Incorporated Reduced-speckle display system
JPH05173094A (ja) 1991-12-20 1993-07-13 Sony Corp レーザ表示装置
US6629641B2 (en) 2000-06-07 2003-10-07 Metrologic Instruments, Inc. Method of and system for producing images of objects using planar laser illumination beams and image detection arrays
US6426836B2 (en) 1996-06-11 2002-07-30 Hewlett-Packard Co. Method and apparatus for reducing the formation of spots in laser projection
JP3986137B2 (ja) 1997-09-26 2007-10-03 オリンパス株式会社 レーザ照明装置及びそれを用いた光学装置
FR2769375B1 (fr) * 1997-10-08 2001-01-19 Univ Joseph Fourier Lentille a focale variable
US6816302B2 (en) 1998-03-02 2004-11-09 Micronic Laser Systems Ab Pattern generator
US6069739A (en) 1998-06-30 2000-05-30 Intel Corporation Method and lens arrangement to improve imaging performance of microlithography exposure tool
JP4345127B2 (ja) 1999-03-18 2009-10-14 ソニー株式会社 照明装置及び照明方法
US6839469B2 (en) 2000-01-21 2005-01-04 Lam K. Nguyen Multiparallel three dimensional optical microscopy system
US6625381B2 (en) 2001-02-20 2003-09-23 Eastman Kodak Company Speckle suppressed laser projection system with partial beam reflection
JP2002267825A (ja) 2001-03-09 2002-09-18 Sony Corp 回折型レンズ素子及びこれを用いた照明装置
US6594090B2 (en) * 2001-08-27 2003-07-15 Eastman Kodak Company Laser projection display system
US6577429B1 (en) * 2002-01-15 2003-06-10 Eastman Kodak Company Laser projection display system
JP4662713B2 (ja) * 2002-02-14 2011-03-30 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 可変フォーカスレンズ
US20060209374A1 (en) * 2003-07-14 2006-09-21 Koninklijke Philips Electronics N.V. Projection device
JP4290095B2 (ja) * 2004-08-16 2009-07-01 キヤノン株式会社 表示光学系および画像表示システム

Also Published As

Publication number Publication date
JP2008511853A (ja) 2008-04-17
EP1787167B1 (de) 2008-04-02
CN100483259C (zh) 2009-04-29
WO2006024998A3 (en) 2006-10-26
US7775670B2 (en) 2010-08-17
JP4658127B2 (ja) 2011-03-23
ATE391309T1 (de) 2008-04-15
CN101010638A (zh) 2007-08-01
WO2006024998A2 (en) 2006-03-09
KR20070048205A (ko) 2007-05-08
DE602005005836T2 (de) 2009-05-14
US20080278692A1 (en) 2008-11-13
EP1787167A2 (de) 2007-05-23

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